发明名称 Evaluation method of device layer structure design for light emitting device, evaluation apparatus and light emitting device
摘要 The present invention is intended to evaluate outgoing light from a light emitting device including a structure in which four or more layers of thin films, including a light-emitting layer, are laminated, in a shorter period of computation time, as compared with conventional methods. An evaluation method for the device layer structure design of a light emitting device is a method for evaluating outgoing light from a light emitting device including a structure in which four or more layers of thin films, including a light-emitting layer, are laminated, using an information processing apparatus, the method including: an input step (S01) of inputting parameters of the thin films constituting the light emitting device and information indicating a spectrum of light emitted from the light-emitting layer; a spectrum calculation step (S03) of generating information based on the parameters input in the input step and indicating the light emitting device divided into meshes only in the lamination direction of the thin films, and calculating a spectrum of outgoing light from the light emitting device by an FDTD method using the generated information and the information indicating the spectrum of the light emitted from the light-emitting layer; and a spectrum information output step (S03) of outputting information indicating the calculated spectrum of outgoing light.
申请公布号 US8257126(B2) 申请公布日期 2012.09.04
申请号 US20080669697 申请日期 2008.06.26
申请人 SAKANO FUMIHIRO;SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 SAKANO FUMIHIRO
分类号 F23Q23/08 主分类号 F23Q23/08
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