发明名称 |
Double rie damascene process for nose length control |
摘要 |
Methods of forming a write pole are disclosed. A first photomask having a first opening over one of a yoke region and a pole tip region of the write pole is formed over an insulation layer having an insulator material. A first etch process is performed on the insulation layer via the first opening, the first etch process removing the insulator material from a corresponding one of the yoke region and the pole tip region. A second photomask having a second opening over the other one of the yoke region and the pole tip region is formed over the insulation layer. A second etch process is performed on the insulation layer via the second opening, the second etch process removing the insulator material from a corresponding one of the yoke region and the pole tip region.
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申请公布号 |
US8257597(B1) |
申请公布日期 |
2012.09.04 |
申请号 |
US20100717090 |
申请日期 |
2010.03.03 |
申请人 |
GUAN LIJIE;SHI CHANGQING;JIANG MING;LI YUN-FEI;WESTERN DIGITAL (FREMONT), LLC |
发明人 |
GUAN LIJIE;SHI CHANGQING;JIANG MING;LI YUN-FEI |
分类号 |
B44C1/22 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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