发明名称 |
Polishing pad and a method for manufacturing the same |
摘要 |
A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300μm The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.
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申请公布号 |
US8257153(B2) |
申请公布日期 |
2012.09.04 |
申请号 |
US20070519339 |
申请日期 |
2007.11.27 |
申请人 |
FUKUDA TAKESHI;HIROSE JUNJI;NAKAMURA KENJI;DOURA MASATO;SATO AKINORI;TOYO TIRE & RUBBER CO., LTD. |
发明人 |
FUKUDA TAKESHI;HIROSE JUNJI;NAKAMURA KENJI;DOURA MASATO;SATO AKINORI |
分类号 |
B24D11/00;B24B37/20;B24B37/24;B29C39/10;B29K75/00;B29K105/04;B29L31/00;B29L31/58;H01L21/304 |
主分类号 |
B24D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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