发明名称 |
SEMICONDUCTOR COMPONENT HAVING A TRANSISTOR AND METHOD OF FABRICATING THE SAME |
摘要 |
<p>PURPOSE: A semiconductor device having a transistor and a manufacturing method thereof are provided to reduce the number of manufacturing steps and production costs by directly forming a source electrode and a drain electrode of the semiconductor device on a channel having high carrier mobility. CONSTITUTION: A carrier substrate(10) is provided. A metal oxide semiconductor layer(11) is formed on the carrier substrate. A dielectric layer(12) is formed on the metal oxide semiconductor layer. A patterned mask layer(13') is formed on the dielectric layer. The dielectric layer is removed to form a plurality of dielectric layer holes(120).</p> |
申请公布号 |
KR20120097303(A) |
申请公布日期 |
2012.09.03 |
申请号 |
KR20110041644 |
申请日期 |
2011.05.02 |
申请人 |
NATIONAL CHIAO TUNG UNIVERSITY |
发明人 |
ZAN HSIAO WEN;TSAI CHUANG CHUANG;MENG HSIN FEI;TSAI WU WEI;CHEN CHIA HSIN |
分类号 |
H01L29/786;H01L21/336;H01L29/78 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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