发明名称 SEMICONDUCTOR COMPONENT HAVING A TRANSISTOR AND METHOD OF FABRICATING THE SAME
摘要 <p>PURPOSE: A semiconductor device having a transistor and a manufacturing method thereof are provided to reduce the number of manufacturing steps and production costs by directly forming a source electrode and a drain electrode of the semiconductor device on a channel having high carrier mobility. CONSTITUTION: A carrier substrate(10) is provided. A metal oxide semiconductor layer(11) is formed on the carrier substrate. A dielectric layer(12) is formed on the metal oxide semiconductor layer. A patterned mask layer(13') is formed on the dielectric layer. The dielectric layer is removed to form a plurality of dielectric layer holes(120).</p>
申请公布号 KR20120097303(A) 申请公布日期 2012.09.03
申请号 KR20110041644 申请日期 2011.05.02
申请人 NATIONAL CHIAO TUNG UNIVERSITY 发明人 ZAN HSIAO WEN;TSAI CHUANG CHUANG;MENG HSIN FEI;TSAI WU WEI;CHEN CHIA HSIN
分类号 H01L29/786;H01L21/336;H01L29/78 主分类号 H01L29/786
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