发明名称 |
APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS |
摘要 |
An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
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申请公布号 |
US2012217414(A1) |
申请公布日期 |
2012.08.30 |
申请号 |
US201213465108 |
申请日期 |
2012.05.07 |
申请人 |
UENO YOSHIFUMI;WAKABAYASHI OSAMU;ABE TAMOTSU;SUMITANI AKIRA;HOSHINO HIDEO;ENDO AKIRA;SOUMAGNE GEORG;GIGAPHOTON INC.;KOMATSU LTD. |
发明人 |
UENO YOSHIFUMI;WAKABAYASHI OSAMU;ABE TAMOTSU;SUMITANI AKIRA;HOSHINO HIDEO;ENDO AKIRA;SOUMAGNE GEORG |
分类号 |
H01J1/50 |
主分类号 |
H01J1/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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