| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. <P>SOLUTION: The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths of 10 to 200 nm and/or charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area on a first surface side with a doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of a dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area on the first surface side of the silicon substrate. The first electrode is connected to the dopant layer. The second electrode is connected to the silicon substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT |
