发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 At least one kind of impurity selected from, for example, Fe, C, B, Ti, Cr is introduced into at least a buffer layer of a compound semiconductor layered structure from a rear surface of the compound semiconductor layered structure to make a resistance value of the buffer layer high.
申请公布号 US2012217543(A1) 申请公布日期 2012.08.30
申请号 US201113328244 申请日期 2011.12.16
申请人 MINOURA YUICHI;KIKKAWA TOSHIHIDE;OHKI TOSHIHIRO;FUJITSU LIMITED 发明人 MINOURA YUICHI;KIKKAWA TOSHIHIDE;OHKI TOSHIHIRO
分类号 H01L29/06;H01L21/22 主分类号 H01L29/06
代理机构 代理人
主权项
地址