| 发明名称 |
POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON GROOVE PATTERN |
| 摘要 |
<p>Polishing pads with concentric or approximately concentric polygon groove patterns are described. Methods of fabricating polishing pads with concentric or approximately concentric polygon groove patterns are also described.Figure 3</p> |
| 申请公布号 |
SG182934(A1) |
申请公布日期 |
2012.08.30 |
| 申请号 |
SG20120004792 |
申请日期 |
2012.01.20 |
| 申请人 |
NEXPLANAR CORPORATION |
发明人 |
ALLISON, WILLIAM C.;SCOTT, DIANE;SIMPSON, ALEXANDER WILLIAM |
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