发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To reduce faults generated in a heat sink. <P>SOLUTION: A semiconductor device comprises: a semiconductor substrate having first and second surfaces and a via hole penetrating through the first and second surfaces; a wire or an electrode formed on the first surface so as to be overlapped with an opening of the via hole at least partially; a stress buffer layer formed on the second surface and having an opening overlapped with the opening of the via hole at least partially; and a heat sink extended from on the stress buffer layer along an inner wall surface of the via hole and electrically connected to the wire or the electrode. A size of the opening of the via hole on the second surface is larger than that on the first surface. A thermal expansion coefficient of the stress buffer layer is less than that of the heat sink. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012164711(A) 申请公布日期 2012.08.30
申请号 JP20110021897 申请日期 2011.02.03
申请人 RENESAS ELECTRONICS CORP 发明人 NISHIKAWA YUTO;OIKAWA YOICHI
分类号 H01L23/34;H01L21/306;H01L21/3065;H01L21/3205;H01L21/768;H01L23/12;H01L23/522 主分类号 H01L23/34
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