发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To reduce faults generated in a heat sink. <P>SOLUTION: A semiconductor device comprises: a semiconductor substrate having first and second surfaces and a via hole penetrating through the first and second surfaces; a wire or an electrode formed on the first surface so as to be overlapped with an opening of the via hole at least partially; a stress buffer layer formed on the second surface and having an opening overlapped with the opening of the via hole at least partially; and a heat sink extended from on the stress buffer layer along an inner wall surface of the via hole and electrically connected to the wire or the electrode. A size of the opening of the via hole on the second surface is larger than that on the first surface. A thermal expansion coefficient of the stress buffer layer is less than that of the heat sink. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012164711(A) |
申请公布日期 |
2012.08.30 |
申请号 |
JP20110021897 |
申请日期 |
2011.02.03 |
申请人 |
RENESAS ELECTRONICS CORP |
发明人 |
NISHIKAWA YUTO;OIKAWA YOICHI |
分类号 |
H01L23/34;H01L21/306;H01L21/3065;H01L21/3205;H01L21/768;H01L23/12;H01L23/522 |
主分类号 |
H01L23/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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