发明名称 NONVOLATILE RESISTIVE MEMORY DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PURPOSE: A nonvolatile resistive memory device and a manufacturing method thereof are provided to improve a memory retention property by preventing interface trap deterioration. CONSTITUTION: A resistance changeable layer(220) is formed on a first electrode layer. An electric charge fixed layer(230) is formed on the resistance changeable layer and is formed by a carbon nano tube. An insulation layer(240) is formed on the electric change fixed layer and a second electrode layer(250) is formed on the insulation layer.
申请公布号 KR20120096234(A) 申请公布日期 2012.08.30
申请号 KR20110015521 申请日期 2011.02.22
申请人 KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION 发明人 KIM, TAE GEUN;KIM, HEE DONG
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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