发明名称 |
NONVOLATILE RESISTIVE MEMORY DEVICE AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PURPOSE: A nonvolatile resistive memory device and a manufacturing method thereof are provided to improve a memory retention property by preventing interface trap deterioration. CONSTITUTION: A resistance changeable layer(220) is formed on a first electrode layer. An electric charge fixed layer(230) is formed on the resistance changeable layer and is formed by a carbon nano tube. An insulation layer(240) is formed on the electric change fixed layer and a second electrode layer(250) is formed on the insulation layer.
|
申请公布号 |
KR20120096234(A) |
申请公布日期 |
2012.08.30 |
申请号 |
KR20110015521 |
申请日期 |
2011.02.22 |
申请人 |
KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION |
发明人 |
KIM, TAE GEUN;KIM, HEE DONG |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|