发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
摘要 <p>161EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHODAn exposure apparatus exposes an object with exposure light. The exposure apparatus includes: a moving body which holds the object and is movable in a predetermined plane, and in which a scale member including a grating is disposed; a10 measurement system which measures positional information of the moving body in the predetermined plane using the scale member; a detection system which detects information regarding foreign matter on a surface of the scale member and the size of the foreign matter; and a cleaning apparatus which can clean the scale member. A cleaning operation is performed on the scale member according to a detection result of the 15 detection system.Fig. 1</p>
申请公布号 SG183057(A1) 申请公布日期 2012.08.30
申请号 SG20120053971 申请日期 2008.12.17
申请人 NIKON CORPORATION 发明人 SHIBAZAKI, YUICHI
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