发明名称 PROCESS FOR THE ELECTROLYTIC COPPER PLATING OF ZINC DIECASTING HAVING A REDUCED TENDENCY TO BLISTER FORMATION
摘要 In the electroplating of zinc diecastings with a copper layer, the electrolyte penetrates into the pores of the zinc diecasting. When the temperature is increased later, this leads to vaporization of the electrolyte liquid in the pores and to blistering or flaking of the copper layer. It is proposed that plating be carried out in two steps. In the first step, only a thin copper layer of less than 1 μm is applied and the plated parts are then treated at a temperature which leads to vaporization of the electrolyte liquid. The thin copper layer is still sufficiently porous for the vapour to be able to escape. Only the solid constituents of the electrolyte remain. The copper layer is then thickened to a final thickness of from about 20 to 30 μm. In this plating step, electrolyte liquid no longer penetrates into the pores of the zinc diecasting. The parts which are coated in this way display no blistering or flaking of the copper layer after storage at a temperature of 150° C.
申请公布号 US2012217166(A1) 申请公布日期 2012.08.30
申请号 US201013395204 申请日期 2010.08.12
申请人 GASSNER FRANZ;STRAUBINGER FRANK;REISSMUELLER KLAUS;WIRTH GUENTER;NEUHAUS SILVIA;UMICORE GALVANOTECHNIK GMBH 发明人 GASSNER FRANZ;STRAUBINGER FRANK;REISSMUELLER KLAUS;WIRTH GUENTER;NEUHAUS SILVIA
分类号 C25D5/10 主分类号 C25D5/10
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