发明名称 THERMAL TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a thermal treatment device capable of uniformly modifying a semiconductor thin film with less thermal load. <P>SOLUTION: An optical system of a thermal treatment device 100 includes a light valve array 4 including: a pair of transparent substrates 10A and 10B; transparent electrodes 11A and 11B provided for the transparent substrates 10A and 10B, respectively; a liquid crystal material 12 sandwiched between the transparent electrodes 11A and 11B; and a pair of polarizing plates 13A and 13B sandwiching the transparent substrates 10A and 10B, the transparent electrodes 11A and 11B, and the liquid crystal material 12. The transparent electrode 11B is segmented in matrix in the light valve array region 14 and each transparent electrode 11B is independently applied with voltage via a selection switch of a driver circuit 15. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012164797(A) 申请公布日期 2012.08.30
申请号 JP20110023783 申请日期 2011.02.07
申请人 HITACHI LTD 发明人 TAI MITSUHARU;KOBAYASHI TAKASHI;SASAKO YOSHITAKA;HANZAWA SATORU;SHIMA AKIO
分类号 H01L21/268;H01L21/20;H01L21/26;H01L21/336;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/268
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