| 摘要 |
<p>195MOVABLE BODY DRIVE METHOD AND MOVABLE BODY DRIVE SYSTEM, PATTERN FORMATION METHOD AND APPARATUS, EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHODA drive device drives a wafer stage (WST) in a Y-axis direction based on a measurement value of an encoder (62A)10 that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale (39Y1) that is measured by the encoder. In this case, the drive device can drive the wafer stage in a predetermined direction based on a measurement value after correction in15 which a measurement error caused by the flatness of the scale included in the measurement value of the encoder is corrected based on the information on the flatness of the scale. Accordingly, the wafer stage can be driven with high accuracy in a predetermined direction using the encoder, without being20 affected by the unevenness of the scale.FIGS. 16A to 160</p> |
