| 摘要 |
WATER-SOLUBLE RESIN COMPOSITION AND METHOD OF FORMING FINE PATTERNS BY USING THE SAMEA water-soluble resin composition for forming fine patterns comprising water-soluble polymer represented by Chemical Formula 1 as below and the First water-soluble solvent, is coated and heated on a photoresist layer having at least one contact hole to reduce a size of the at least one contact hole.[err] (1)(In Chemical Formula 1,each of R[err], R[err], R[err] and R[err] independently represents an alkyl group of C[err] or an cyclo alkyl group of C[err] which respectively have one selected from the group consisting of hydrogen, an ether group, an ester group, a carbonyl group, an acetal, an epoxy group, a nitril group, an amine group, and an aldehyde group;each of R[err], R[err], R[err] and R[err] independently represents hydrogen or a methyl group; n represents an integer of 0 to 5;a represents a real number of 0.05 to 0.5;each of b, c and d respectively represents a real number of 0 to 0.7; and a+b+c+d= 1 )
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