| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cured film which achieves contrast improvement in developing during a lithography process and attains excellent smoothness by preventing, in drying thereafter, foaming, swelling, peeling or the like of the coating film. <P>SOLUTION: A photosensitive resin composition includes (A) amide acid obtained by reacting (a) a compound including two or more amino groups in one molecule with (b) a compound including two or more dibasic acid anhydride groups in one molecule, (B) a polyamide resin with a phenolic hydroxyl group, and (C) a photoacid generator. <P>COPYRIGHT: (C)2012,JPO&INPIT |
