发明名称 METHOD FOR FORMING A WIRING PATTERN BY LASER IRRADIATION
摘要 A method for forming a wiring pattern by laser irradiation includes the steps of coating a light-sensitive material on a substrate to form a light-sensitive layer, irradiating a laser beam on the light-sensitive material of the substrate to form a pattern including an exposed region exposed to laser irradiation and an unexposed region unexposed to laser irradiation, and forming a metallic wiring pattern by immersing the substrate into a solution having a plurality of metallic nano-particles. The metallic nano-particles are easily bonded to the straighter molecular structure of the light-sensitive material in the exposed region for forming a conducting wiring pattern. The laser irradiation method has advantages such as high-power, high-density, high-directionality and monochromaticity, such that product quality can be effectively controlled. Moreover, the laser irradiated light-sensitive material can form a molecular structure that is easily bonded to the metallic particles. As a result, the chemical wastes are substantially reduced.
申请公布号 US2012219918(A1) 申请公布日期 2012.08.30
申请号 US201113036634 申请日期 2011.02.28
申请人 HO CHIEN-HAN;HUANG HUA-MIN 发明人 HO CHIEN-HAN;HUANG HUA-MIN
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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