发明名称 COMPOSITION FOR FORMING N-TYPE DIFFUSION LAYER, METHOD FOR FORMING N-TYPE DIFFUSION LAYER, AND METHOD FOR PRODUCING PHOTOVOLTAIC CELL
摘要 <p>The composition for forming an n-type diffusion layer in accordance with the present invention contains a donor element-containing glass powder and a dispersion medium. An n-type diffusion layer and a photovoltaic cell having an n-type diffusion layer are prepared by applying the composition for forming an n-type diffusion layer, followed by a thermal diffusion treatment.</p>
申请公布号 SG182734(A1) 申请公布日期 2012.08.30
申请号 SG20120055273 申请日期 2011.01.25
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 YOSHIDA, MASATO;NOJIRI, TAKESHI;OKANIWA, KAORU;IWAMURO, MITSUNORI;AOYAGI, TAKUYA;MACHII, YOICHI;ADACHI, SHUICHIRO
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