发明名称 |
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the number of photomasks used for manufacturing a transistor and for manufacturing a display device compared with the former. <P>SOLUTION: A display device is manufactured through three photolithography steps in total: one photolithography step for forming a gate electrode and forming an island-shaped semiconductor layer; one photolithography step for forming a planarization insulation layer and then forming a contact hole; and one photolithography step for forming a source electrode and a drain electrode and forming a pixel electrode. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012164976(A) |
申请公布日期 |
2012.08.30 |
申请号 |
JP20120006104 |
申请日期 |
2012.01.16 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
KUWABARA HIDEAKI |
分类号 |
H01L29/786;G02F1/1368;H01L21/336;H01L51/50;H05B33/08;H05B33/10;H05B33/12;H05B33/22;H05B33/26;H05B33/28 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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