发明名称 METHOD OF MANUFACTURING SOLID-STATE IMAGING ELEMENT, SOLID-STATE IMAGING ELEMENT AND ELECTRONIC APPARATUS
摘要 A method of manufacturing a solid-state imaging element includes: manufacturing an element chip in which photoelectric conversion units are arranged on a main surface side; preparing a base configured using a material with an expansion coefficient greater than the element chip and having an opening of which the periphery of the opening is shaped as a flat surface; expanding the base by heating, mounting the element chip on the flat surface of the base in a state where the opening of the base is covered; and three-dimensionally curving a portion corresponding to the opening in the element chip by cooling and contracting the base in a state where the element chip is fixed to the flat surface of the expanded base.
申请公布号 US2012217606(A1) 申请公布日期 2012.08.30
申请号 US201213399113 申请日期 2012.02.17
申请人 ITONAGA KAZUICHIRO;SONY CORPORATION 发明人 ITONAGA KAZUICHIRO
分类号 H01L27/146;H01L31/0352;H01L31/18 主分类号 H01L27/146
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