| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fluid supply member, a liquid processing apparatus, and a liquid processing method which can improve uniformity of cleaning on the substrate surface. <P>SOLUTION: The fluid supply member comprises a body extending from a first point to a second point in the first direction, and a plurality of fluid discharge portions provided in the body and arranged in the first direction while opening in the second direction intersecting the first direction. The opening angle of a fluid discharge portion on the first point side, out of the plurality of fluid discharge portions, is smaller than that of a fluid discharge portion on the second point side. <P>COPYRIGHT: (C)2012,JPO&INPIT |
