FLARE PREDICTION METHOD, PHOTOMASK FABRICATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND FLARE PREDICTION PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a flare prediction method capable of predicting flare with high precision and in a short computation time.

SOLUTION: There is provided a flare prediction method in a photolithography comprising: a step S14 of obtaining a pattern density distribution of a pattern layout; a step S15 of obtaining a gradient of change in the pattern density distribution; and steps S16 to S19 of performing flare computations in a plurality of division sizes which are based on the gradient of change in the pattern density distribution.

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