| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an appropriate management system of an X-ray exposure amount to every product substrate having a different mode of exposure. <P>SOLUTION: A management system of an X-ray exposure amount used for an X-ray imaging apparatus which takes an image of a principal imaging part of a substrate mounted with electronic components with X-ray comprises: substrate identification means which identifies a substrate W for every product; and accumulated exposure amount integration means which calculates an accumulated exposure amount H of the identified product substrate. The accumulated exposure amount H of X-ray imaging is calculated for every product substrate, so that each product substrate can be controlled not to be exposed at a level exceeding the upper limit, even in the case that every product substrate has a different exposure amount due to, for example, re-inspections or spot checks. <P>COPYRIGHT: (C)2012,JPO&INPIT |
