发明名称 |
COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE CHANGE MATERIALS |
摘要 |
<p>The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing a substrate comprising a phase change material (PCM), such as a germanium-antimony-tellurium (GST) alloy. The composition comprises a particulate abrasive material in combination with lysine, an optional oxidizing agent, and an aqueous carrier therefor. CMP methods for polishing a phase change material-containing substrate utilizing the composition are also disclosed.Figure 1</p> |
申请公布号 |
SG183081(A1) |
申请公布日期 |
2012.08.30 |
申请号 |
SG20120055414 |
申请日期 |
2008.07.24 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
CHEN, ZHAN;LUO, KAI;VACASSY, ROBERT |
分类号 |
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代理机构 |
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代理人 |
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