发明名称 |
VAPOR DEPOSITION APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an evaporation apparatus that can improve the utilization efficiency of a deposition material by evaporating a small amount of the deposition material. <P>SOLUTION: A vapor deposition apparatus 10 that vapor-deposition-forms a thin film on a substrate includes: a vessel 3 accommodating a deposition material P comprising an organic material; a conductivity granular mixture 4 mixed with the deposition material P accommodated in the vessel 3; and a heating part 5 induction-heating the granular mixture 4 in the vessel 3, wherein the volume ratio of the granular mixture 4 to the deposition material P is a value in a range of at least 1/10,000 but less than 1/100. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012162774(A) |
申请公布日期 |
2012.08.30 |
申请号 |
JP20110024641 |
申请日期 |
2011.02.08 |
申请人 |
KONICA MINOLTA HOLDINGS INC |
发明人 |
MANDA YASUHARU;TOBISAWA SEIICHI |
分类号 |
C23C14/24;C23C14/12;H01L51/50;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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