发明名称 VAPOR DEPOSITION APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an evaporation apparatus that can improve the utilization efficiency of a deposition material by evaporating a small amount of the deposition material. <P>SOLUTION: A vapor deposition apparatus 10 that vapor-deposition-forms a thin film on a substrate includes: a vessel 3 accommodating a deposition material P comprising an organic material; a conductivity granular mixture 4 mixed with the deposition material P accommodated in the vessel 3; and a heating part 5 induction-heating the granular mixture 4 in the vessel 3, wherein the volume ratio of the granular mixture 4 to the deposition material P is a value in a range of at least 1/10,000 but less than 1/100. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012162774(A) 申请公布日期 2012.08.30
申请号 JP20110024641 申请日期 2011.02.08
申请人 KONICA MINOLTA HOLDINGS INC 发明人 MANDA YASUHARU;TOBISAWA SEIICHI
分类号 C23C14/24;C23C14/12;H01L51/50;H05B33/10 主分类号 C23C14/24
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