发明名称 |
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS |
摘要 |
Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
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申请公布号 |
US2012219902(A1) |
申请公布日期 |
2012.08.30 |
申请号 |
US201213407529 |
申请日期 |
2012.02.28 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
BAE YOUNG CHEOL;PARK JONG KEUN;LEE SEUNG-HYUN;LIU YI;CARDOLACCIA THOMAS;BELL ROSEMARY |
分类号 |
G03F7/20;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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