| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novolak phenolic resin for photoresists which has high heat resistance, a high resolving degree and high sensitivity at the same time and improves workability, its manufacturing method, and a novolak resin for photoresists obtained therefrom. <P>SOLUTION: The novolak type phenolic resin for photoresists comprises a phenol (P) containing m-cresol and/or phenol and an aromatic aldehyde (A) containing a benzaldehyde (a1) and a monohydroxybenzaldehyde (a2) as crosslinking groups at a weight ratio (a1/a2) of 50/50 to 95/5, and its manufacturing method is disclosed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
