| 摘要 |
A magnetic recording disk has surface features of elevated lands and recessed grooves, and a planarized upper surface. A chemical-mechanical-polishing (CMP) stop layer is deposited over the lands and into the recesses. An adhesion film, like silicon, is deposited over the CMP stop layer, and fill material containing a silicon oxide (SiOx) is deposited over and in contact with the adhesion film. The adhesion film improves the adhesion of the SiOx fill material and prevents delamination during a subsequent two-step CMP planarizing process. |
