发明名称 |
Positive photosensitive composition and method of forming resist pattern |
摘要 |
A positive photosensitive composition comprises: (A) 5 to 20 parts by weight of the total amount of at least one compound that generates an acid upon irradiation with an actinic ray; and (B) 100 parts by weight of the total amount of at least one fluorine atom-containing resin having a group that increases a solubility of the resin in an alkaline developer by the action of an acid.
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申请公布号 |
US8252508(B2) |
申请公布日期 |
2012.08.28 |
申请号 |
US20100819490 |
申请日期 |
2010.06.21 |
申请人 |
KODAMA KUNIHIKO;FUJIFILM CORPORATION |
发明人 |
KODAMA KUNIHIKO |
分类号 |
G03F7/004;G03F7/039;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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