发明名称 Semiconductor device and method of forming through hole vias in die extension region around periphery of die
摘要 A semiconductor wafer contains a plurality of semiconductor die. The semiconductor wafer is diced to separate the semiconductor die. The semiconductor die are transferred onto a carrier. A die extension region is formed around a periphery of the semiconductor die on the carrier. The carrier is removed. A plurality of through hole vias (THV) is formed in first and second offset rows in the die extension region. A conductive material is deposited in the THVs. A first RDL is formed between contact pads on the semiconductor die and the THVs. A second RDL is formed on a backside of the semiconductor die in electrical contact with the THVs. An under bump metallization is formed in electrical contact with the second RDL. Solder bumps are formed on the under bump metallization. The die extension region is singulated to separate the semiconductor die.
申请公布号 US8252666(B2) 申请公布日期 2012.08.28
申请号 US20100858615 申请日期 2010.08.18
申请人 BATHAN HENRY DESCALZO;CAMACHO ZIGMUND RAMIREZ;TAY LIONEL CHIEN HUI;TRASPORTO ARNEL SENOSA;STATS CHIPPAC, LTD. 发明人 BATHAN HENRY DESCALZO;CAMACHO ZIGMUND RAMIREZ;TAY LIONEL CHIEN HUI;TRASPORTO ARNEL SENOSA
分类号 H01L21/30 主分类号 H01L21/30
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