发明名称 OPTICAL APPARATUS, METHOD OF SCANNING, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 PURPOSE: An optical device, a scanning method, a lithography device, and a device manufacturing method are provided to remove position setting errors between an alignment sensor and an overlay measuring device by using the alignment sensor to measure target asymmetry. CONSTITUTION: An optical device includes an object lens(524) and a movable optical element. The object lens transmits radiation between an object and an optical system of the optical device. The optical element includes a mirror(562) arranged between the optical system and the object lens. A mirror is inclined to change the direction of the radiation by the object lens. The mirror is inclined around an axis along an intersection between a pupil plane of the object lens and the plane of the mirror.
申请公布号 KR20120095317(A) 申请公布日期 2012.08.28
申请号 KR20120016249 申请日期 2012.02.17
申请人 ASML NETHERLANDS B.V. 发明人 DEN BOEF ARIE JEFFREY
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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