| 摘要 |
A vapor deposition device includes a holding compartment and a reaction device. The holding compartment defines a receiving chamber and includes a number of inner side surfaces and a number of holding plates disposed on the respective inner side surfaces, each holding plate defines a number of holding grooves for holding substrates. The reaction device is rotatably received in the receiving chamber and includes an outer barrel and an inner barrel received in the outer barrel, the outer barrel and the inner barrel cooperatively defines a first room, the inner barrel defines a second room; the reaction device includes ion nozzles communicating with the second room and precursor gas nozzles communicating with the first room; the outer barrel includes at least one crucible and at least one electron beam gun received in the first room, the inner barrel includes an ion source received in the second room. |
