发明名称 |
SELF-ALIGNED MASKING FOR SOLAR CELL MANUFACTURE |
摘要 |
<p>Various methods of utilizing the physical and chemical property differences between amorphized and crystalline silicon are used to create masks that can be used for subsequent implants. In some embodiments, the difference in film growth between amorphous and crystalline silicon is used to create the mask. In other embodiments, the difference in reflectivity or light absorption between amorphous and crystalline silicon is used to create the mask. In other embodiments, differences in the characteristics of doped and undoped silicon is used to create masks.</p> |
申请公布号 |
KR20120095410(A) |
申请公布日期 |
2012.08.28 |
申请号 |
KR20127014106 |
申请日期 |
2010.11.02 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
BATEMAN NICHOLAS P. T.;MAYNARD HELEN L.;RIORDON BENJAMIN B.;HATEM CHRISTOPHER R.;RAMAPPA DEEPAK |
分类号 |
H01L21/266;H01L31/18 |
主分类号 |
H01L21/266 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|