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发明名称
ETCHING PROCESS FOR SEMICONDUCTORS
摘要
申请公布号
KR20120095411(A)
申请公布日期
2012.08.28
申请号
KR20127014823
申请日期
2010.11.02
申请人
3M INNOVATIVE PROPERTIES COMPANY
发明人
HAASE MICHAEL A.;SMITH TERRY L.;ZHANG JUN YING
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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