发明名称 Nonvolatile semiconductor memory and method for fabricating the same
摘要 A nonvolatile semiconductor memory includes a first semiconductor layer; second semiconductor regions formed on the first semiconductor layer having device isolating regions extended in a column direction; a first interlayer insulator film formed above the first semiconductor layer; a lower conductive plug connected to the second semiconductor regions; a first interconnect extended in a row direction; a second interlayer insulator formed on the lower conductive plug and the first interlayer insulator film; an upper conductive plug; and a second interconnect formed on the second interlayer insulator contacting with the top of the upper conductive plug extended in the column direction.
申请公布号 US8253182(B2) 申请公布日期 2012.08.28
申请号 US20090588203 申请日期 2009.10.07
申请人 KAJIMOTO MINORI;NOGUCHI MITSUHIRO;GODA AKIRA;KABUSHIKI KAISHA TOSHIBA 发明人 KAJIMOTO MINORI;NOGUCHI MITSUHIRO;GODA AKIRA
分类号 H01L21/28;H01L29/76;H01L21/768;H01L21/8246;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/28
代理机构 代理人
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