发明名称 |
Method of manufacture of wafers using an electro-chemical residue sensor (ECRS) |
摘要 |
A method of improving the clean, rinse and dry processes during the manufacture of ICs, MEMS and other micro-devices to conserve solution and energy while completing the process within a specified time. An electro-chemical residue sensor (ECRS) provides in-situ and real-time measurement of residual contamination on a surface or inside void micro features within the sensor representative of conditions on production wafers. The in-situ measurements are used to design and optimize a production process. The wafers are manufactured in accordance with the production process without the ECRS. |
申请公布号 |
US8253422(B2) |
申请公布日期 |
2012.08.28 |
申请号 |
US201113048703 |
申请日期 |
2011.03.15 |
申请人 |
VERMEIRE BERT M.;SHADMAN FARHANG F.;ENVIRONMENTAL METROLOGY CORPORATION |
发明人 |
VERMEIRE BERT M.;SHADMAN FARHANG F. |
分类号 |
G01R31/08 |
主分类号 |
G01R31/08 |
代理机构 |
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代理人 |
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地址 |
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