METHOD AND APPARATUS FOR CLEANING PROCESS CHAMBER COMPONENT

摘要

PURPOSE: A method for cleaning a process chamber component and an apparatus thereof are provided to reduce costs and prevent environmental contamination without using chemicals for cleaning. CONSTITUTION: A sprayed film(3) is formed on a base material(2). Water-jet of 500bar to 1000bar pressure is applied to a processing chamber component(1). The sprayed film of the processing chamber component and a film(4) formed on the sprayed film are removed. The sprayed film includes a flame spraying film formed on the base material and an arc spraying film formed on the flame spraying film.