发明名称 METHOD OF MANUFACTURING SUBSTRATE
摘要 PURPOSE: A method for manufacturing a substrate is provided to accurately process a surface roughness and a thickness of a wafer by maintaining an amount of abrasives and a particle size of the abrasives. CONSTITUTION: An ingot is cut with a wafer shape(S110). Both sides of the substrate cut with the wafer shape are lapped(S120). A sand blasting is performed by spraying abrasives on one surface of the substrate cut with the wafer shape(S130). The sand-blasted substrate is thermally processed(S140). The front surface of the thermally processed substrate is polished(S162).
申请公布号 KR20120094313(A) 申请公布日期 2012.08.24
申请号 KR20110013738 申请日期 2011.02.16
申请人 HANSOL TECHNICS INC. 发明人 KANG, JIN KI;MA, JAE YOUNG;PARK, HONG JIN;LEE, KYOUNG HO
分类号 H01L21/304 主分类号 H01L21/304
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