发明名称 |
METHOD OF MANUFACTURING SUBSTRATE |
摘要 |
PURPOSE: A method for manufacturing a substrate is provided to accurately process a surface roughness and a thickness of a wafer by maintaining an amount of abrasives and a particle size of the abrasives. CONSTITUTION: An ingot is cut with a wafer shape(S110). Both sides of the substrate cut with the wafer shape are lapped(S120). A sand blasting is performed by spraying abrasives on one surface of the substrate cut with the wafer shape(S130). The sand-blasted substrate is thermally processed(S140). The front surface of the thermally processed substrate is polished(S162). |
申请公布号 |
KR20120094313(A) |
申请公布日期 |
2012.08.24 |
申请号 |
KR20110013738 |
申请日期 |
2011.02.16 |
申请人 |
HANSOL TECHNICS INC. |
发明人 |
KANG, JIN KI;MA, JAE YOUNG;PARK, HONG JIN;LEE, KYOUNG HO |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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