发明名称 3D-NONVOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A nonvolatile memory device with a 3D structure and a manufacturing method thereof are provided to improve the integration of a memory device by alternatively arranging adjacent source selection lines. CONSTITUTION: A plurality of channel structures(A) include a plurality of channel films(32) and a plurality of interlayer dielectric films(31) which are alternatively laminated on a substrate. A source structure(B) includes a plurality of source lines and a plurality of interlayer dielectric films which are alternatively laminated on the substrate. The source structure is extended in a second direction cross a first direction and is contacted with the plurality of channel structures. A plurality of word lines surround the plurality of the channel structures and are parallel in the second direction.
申请公布号 KR20120094339(A) 申请公布日期 2012.08.24
申请号 KR20110013782 申请日期 2011.02.16
申请人 SK HYNIX INC. 发明人 SHIN, HACK SEOB;OH, SANG HYUN
分类号 G11C16/02;G11C16/08 主分类号 G11C16/02
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