METHOD FOR PRODUCING THIN FILM AND VAPOR DEPOSITION MATERIAL FOR CO-VAPOR DEPOSITION FOR FORMING THIN FILM, THIN FILM OBTAINED BY THE METHOD, THIN FILM SHEET HAVING THE THIN FILM, AND LAMINATED SHEET

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a thin film superior in transparency and gas barrier property, to provide a vapor deposition material for co-vapor deposition, which is suitable for forming the thin film, to provide a thin film obtained by the method, and to provide a thin film sheet having the thin film and a laminated sheet.

SOLUTION: The method for producing a thin film is characterized by using a sublimable vapor deposition material composed of a first oxide and a meltable vapor deposition material composed of a second oxide, and then forming an oxide thin film constituted of the first oxide and the second oxide on a substrate by a co-vapor deposition method comprising simultaneously vapor depositing the oxides by a vacuum film deposition process.

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