发明名称 RADIATION CURABLE RESIN COMPOSITION AND RAPID PROTOTYPING PROCESS USING THE SAME
摘要 The invention relates to radiation curable compositions which are particularly suitable for the production of three-dimensional shaped articles by means of stereolithography, to a process for the production of a cured product and, in particular, for stereolithographic production of three dimensional shaped articles from this composition having excellent moisture resistance. The radiation curable composition of the invention comprises relative to the total weight of the composition A 0-29 wt.% of a cationically curable component having a linking aliphatic ester group, preferably component A comprises two cyclohexene oxide groups B 10-85 wt.% of an epoxy group containing component other than A C 1-50 wt.% of an oxetane group containing component D 1-25 wt.% of a multifunctional acrylate E a radical photoinitiator F a cationic photoinitiator, wherein the amount of components having linking aliphatic ester groups is preferably less than 100 meq of ester links/100 g of composition, more preferably the amount of components having linking aliphatic ester groups is less than 25 meq of ester links/100 g of composition.
申请公布号 KR101176747(B1) 申请公布日期 2012.08.23
申请号 KR20117006984 申请日期 2003.05.01
申请人 发明人
分类号 C08G65/18;G03F7/038;B29C35/04;C08F283/02;C08G59/17;C08L33/08;C08L63/00;G03C1/73;G03F7/00 主分类号 C08G65/18
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