发明名称 |
In-Situ Accuracy Control in Flux Dipping |
摘要 |
A flux dipping apparatus includes a flux plate having a top surface; and a dipping cavity in the flux plate and recessed from the top surface. A flux leveler is disposed over the flux plate and configured to move parallel to the top surface. A piezoelectric actuator is configured to adjust a distance between the flux leveler and the top surface in response to a controlling voltage applied to electrodes of the first piezoelectric actuator. |
申请公布号 |
US2012211547(A1) |
申请公布日期 |
2012.08.23 |
申请号 |
US201113031040 |
申请日期 |
2011.02.18 |
申请人 |
HSIAO YI-LI;YU CHEN-HUA;LIU CHUNG-SHI;HWANG CHIEN LING;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
HSIAO YI-LI;YU CHEN-HUA;LIU CHUNG-SHI;HWANG CHIEN LING |
分类号 |
B23K1/20;B23K3/08 |
主分类号 |
B23K1/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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