| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide means for forming unevenness that prevents mirror reflection of a reflection electrode without increasing the number of manufacturing steps of an active matrix substrate. <P>SOLUTION: In a manufacturing method for an active matrix substrate used for a reflective liquid crystal display device, for forming unevenness on a surface of a pixel electrode (reflection electrode) to scatter light, convex parts 701 and 702 are formed through patterning using the same photomask as that used for forming a TFT, thereby forming unevenness on a surface of a pixel electrode 169. <P>COPYRIGHT: (C)2012,JPO&INPIT |
