| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fine particle low valence niobium oxide composition which is suitable for producing a low valence niobium oxide-doped zinc oxide target not generating abnormal discharge at the sputtering time, and to provide a production method capable of producing the fine particle low valence niobium oxide composition extremely inexpensively. <P>SOLUTION: The fine particle low valence niobium oxide composition having a peak of low valence niobium oxide in which the valence of niobium is lower than 5 in an X-ray diffraction profile, and having a primary particle size of 50 nm-1 μm, can be produced through a process in which a mixture of niobium oxide and carbon are fired at 1,000-1,600°C in an atmosphere-containing gas flow in a closed system container having a function capable of discharging internal gas to the outside when the inner pressure rises. <P>COPYRIGHT: (C)2012,JPO&INPIT |
