| 摘要 |
<p>The invention relates to a Microlithography projection system for imaging an object field in an object plane (100) onto an image field in an image plane (102) with a wavelength », wherein the microlithography projection system is a catoptric projection system comprising
at least one intermediate image (Z1) of the object and an aperture stop (B) in the optical path of a beam of light from the object plane (100) to the image plane (102), wherein the aperture stop (B) in the optical path is arranged downstream the at least one intermediate image (Z1).</p> |
