发明名称 |
LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC PROJECTION METHOD |
摘要 |
A lithographic apparatus, includes an illumination system configured to condition a radiation beam, a first support constructed to support a first patterning device and a second support to support a second patterning device, the first and second patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The first support and second support are movable in a scanning direction and in a second direction substantially perpendicular to the scanning direction. By movement of the first support and second support in the second direction the first support and second support can selectively be aligned with the projection system.
|
申请公布号 |
US2012212715(A1) |
申请公布日期 |
2012.08.23 |
申请号 |
US201213401597 |
申请日期 |
2012.02.21 |
申请人 |
BEERENS RUUD ANTONIUS CATHARINA MARIA;DE GROOT ANTONIUS FRANCISCUS JOHANNES;ASML NETHERLANDS B.V. |
发明人 |
BEERENS RUUD ANTONIUS CATHARINA MARIA;DE GROOT ANTONIUS FRANCISCUS JOHANNES |
分类号 |
G03B27/42;G03B27/46;G03B27/62 |
主分类号 |
G03B27/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|