| 摘要 |
<P>PROBLEM TO BE SOLVED: To refine contaminated chlorosilane extremely inexpensively, and to concentrate impurities existing in that case into a maximally small carrying-out amount and to carry it out. <P>SOLUTION: In the refining method by distillation of chlorosilane having processes for preparing a boron-containing mixture comprising chlorosilane containing TCS, DCS and STC, and for refining the mixture comprising chlorosilane by distillation in a plurality of distillation columns, a boron compound having a low boiling point is split from a distillation column by a column top flow containing DCS having a heightened boron concentration, and a boron compound having a high boiling point is split from a distillation column by a column bottom flow having a heightened boron concentration containing a substance having a high boiling point. <P>COPYRIGHT: (C)2012,JPO&INPIT |
