发明名称 Method for Fabricating a Semiconductor Component based on GaN
摘要 A semiconductor component has a plurality of GaN-based layers, which are preferably used to generate radiation, produced in a fabrication process. In the process, the plurality of GaN-based layers are applied to a composite substrate that includes a substrate body and an interlayer. A coefficient of thermal expansion of the substrate body is similar to or preferably greater than the coefficient of thermal expansion of the GaN-based layers, and the GaN-based layers are deposited on the interlayer. The interlayer and the substrate body are preferably joined by a wafer bonding process.
申请公布号 US2012211787(A1) 申请公布日期 2012.08.23
申请号 US201213398425 申请日期 2012.02.16
申请人 BADER STEFAN;EISERT DOMINIK;HAHN BERTHOLD;HAERLE VOLKER;OSRAM GMBH 发明人 BADER STEFAN;EISERT DOMINIK;HAHN BERTHOLD;HAERLE VOLKER
分类号 H01L33/60;H01L27/15;H01L33/00;H01L33/40;H01L33/44 主分类号 H01L33/60
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