Filter for filtering undesired light portions in projection exposure system for microlithography, has lattice arrangement formed on glass plate that is transparent to light having particular wavelength or wavelength range

摘要

The filter (4) has multiple fields (7) arranged next to each other, where each field is assigned with a light beam of particular wavelength so as to be transmissive or impermeable based on the wavelength range of the light beam. A lattice arrangement (10) encloses and defines the fields, where the lattice arrangement is formed on a glass plate (9) that is transparent to light having the particular wavelength or wavelength range. The lattice arrangement is formed such that a metal opaque stopper (13) is releasably inserted into the fields. An independent claim is also included for a projection exposure system for microlithography.