| 摘要 |
<p>The present invention is a photoresist composition to be developed with an organic solvent, which is characterized by comprising [A] a polymer having an acid-labile group, [B] an acid generator, and [C] a compound having both at least one group selected from a hydroxyl group, a carboxyl group, a group that can be converted into a carboxyl group by the action of an acid and a group having a lactone structure and a ring structure and having a molecular weight of 1,000 or less. The ring structure in the compound [C] is preferably a polycyclic alicyclic structure. The compound [C] is preferably at least one compound selected from the group consisting of compounds respectively represented by formulae (1)-(3).</p> |
